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CMP Process
Abrasive Slurry Pump
KNF's Model NDT300.23AA
shown with a TENV motor
Designed to circulate the corrosive, abrasive slurry polishing compounds required in the Damascene semiconductor polishing process, this pump replaces the expensive pumps made with Teflon® resin previously used. This pump provides 6-9 months of operation before requiring simple maintenance.
Datasheet available: Click HERE (PDF:270kb/1pg) |